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homeProductssputtering targets Indium Tin Oxide sputtering target
Indium Tin Oxide sputtering target
| Model Number:-- | Place of Origin:China |
| Price:-- | Packing:-- |
| Transport mode:-- | Minimum Order:1 piece |
Company Info
Company Published:1998-1-1
Online Postings: Products (13), offers (13)
Country/Territory: China
Business Type: Manufacture
Number of Employees: 51 ~ 200 People
Online Postings: Products (13), offers (13)
Country/Territory: China
Business Type: Manufacture
Number of Employees: 51 ~ 200 People
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Detailed Product Description
| ITO Target |
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| Principal Uses | |||
| Transparent conductive ITO film deposited by Magnetic Sputtering. | |||
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| Physical Properties | ||||||||||||||||||||||||
| Chemical Formula | : | In2O3/SnO2 | ||||||||||||||||||||||
| Relative Density | : | >=99% | ||||||||||||||||||||||
| Crystal Particle Size | : | 5~15µm | ||||||||||||||||||||||
| Electrical Resistivity | : | 0.12m ·cm | ||||||||||||||||||||||
| Linear Thermal Expansion | : | 8.2×10-3K-1 | ||||||||||||||||||||||
| Purity | : | >=99.99% | ||||||||||||||||||||||
| Appearance | : | Black Ceramic Piece | ||||||||||||||||||||||
| Impurity (unit: ppm) | : |
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| Characterisation Methods | |||
| Crystal Particle Size | : | Observed by SEM | |
| Purity | : | Tested by ICP—AES means | |
| Density | : | Tested by Archimedes Means | |
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Indium Tin Oxide sputtering target
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Yiwei Advanced Materials Limited
[China]
City : Wuhan
Province/State : Hubei
Country/Region : China
